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Nanometer Displacement Measurement System | 711

Nanometer Displacement Measurement System | 711

This is a new optical interferometry system that is not limited by the accuracy of the optical elements or the object being measured, based on the fact that the statistics of the scattering field (laser speckle) generated when a rough surface object is irradiated by a laser is completely random in a statistical sense.

 

Expected Applications

• Operation analysis of micro mechanical components such as MEMS
• Applications where strain gages are not applicable (measurement of deformation and thermal strain characteristics of polymer materials and micro-jointed parts)
• Biological samples (measurement of ultra-short time behavior of plant growth, high-precision growth monitoring of crops in plant factories, setting of optimal cultivation conditions)
• Environmental measurement (environmental assessment using living organisms)

 

Features

• High precision measurement – Sub-nanometer order measurement is possible (The measurement system is simply determined by the number of data points used.)
• Non-contact, non-invasive measurement
• Simple optical system
• No absolute reference point required for measurement (any two points can be used)

 

 

Model NS-1
Laser Wavelength: 660nm 

Maximum output: 90mW

Class 3B equivalent
Laser beam diameter Approx. 1.0mm
Laser beam interval Approx. 3.0mm
Measurement accuracy ±1.0nm
Measurement range 0 to 3mm
PC & software Provided as standard accessories
Frame rate 2fps
Power supply Single-phase, AC100V, 50/60Hz, 5A
Dimensions • W240 × D200 × H280mm (Main unit)

• W390 × D320 × H200mm (Control unit)
Weight (approx.) • 5kg (Main unit)

• 6kg (Control unit)

 

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